Small Electron Beam Evaporation R&D Equipment
Compact high-purity evaporation for optical and device research
System Overview
The HN-EB-R-009 is a compact electron beam evaporation system tailored for optical coating research, semiconductor device layer development, and thin-film physics studies. Its intuitive touchscreen interface and small chamber volume make it an accessible, high-precision tool for research groups depositing optical multilayers, transparent conductive oxides, and dielectric films.
Working Principle
Focused electron beam evaporation heats source materials in a cooled copper hearth, generating a controlled vapor flux directed at the substrate. In-situ quartz crystal monitoring provides real-time deposition rate and cumulative thickness feedback, enabling precise optical layer control. Ion-assist capability is available for improved film density at low substrate temperatures.
Core Advantages
- Compact benchtop-compatible form factor
- High material purity with minimal filament contamination
- Integrated touchscreen with intuitive recipe programming
- Multi-material hearth for sequential optical stack deposition
- QCM thickness and rate control included as standard
- Ion-assist option for low-temperature dense film deposition
- Compatible with standard optical substrate sizes
Technical Specifications
| Chamber | φ450 mm optical-grade electropolished chamber |
|---|---|
| Evaporation Source | 6 kW, 4-crucible compact E-type electron-beam gun |
| Vacuum System | Turbomolecular high-vacuum system |
| Temperature Control | Low-stress precision temperature control |
| Monitoring | High-precision optical extremum monitor |
| Control | Automatic crucible rotation with alternating multilayer evaporation cycles |
Specifications are representative. Final system parameters are defined during configuration. Contact our engineering team for detailed documentation.
